@prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#>.
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#>.
@prefix owl: <http://www.w3.org/2002/07/owl#>.
@prefix skos: <http://www.w3.org/2004/02/skos/core#>.
@prefix xl: <http://www.w3.org/2008/05/skos-xl#>.
@prefix rdag1: <http://RDVocab.info/ElementsGr1/>.
@prefix rda: <http://RDVocab.info/ElementsGr2/>.
@prefix rdaa: <http://rdaregistry.info/Elements/a/>.
@prefix frbrent: <http://RDVocab.info/uri/schema/FRBRentitiesRDA/>.
@prefix foaf: <http://xmlns.com/foaf/0.1/>.
@prefix ndl: <http://ndl.go.jp/dcndl/terms/>.
@prefix dct: <http://purl.org/dc/terms/>.

<http://id.ndl.go.jp/auth/ndlna/01102349>
	foaf:primaryTopic <http://id.ndl.go.jp/auth/entity/01102349>;
	rdf:type <http://www.w3.org/2004/02/skos/core#Concept>;
	dct:modified "2007-09-26T16:49:04";
	dct:created "2007-09-26";
	xl:prefLabel [xl:literalForm "石垣, 隆正";ndl:transcription "イシガキ, タカマサ"@ja-Kana,"Ishigaki, Takamasa"@ja-Latn];
	rdfs:label "石垣, 隆正";
	dct:source "反応場制御による新しい材料プロセッシング / 北澤宏一 監修 ; 石垣隆正, 目義雄, 伊ヶ崎文和 編著","名称: 初出資料","読み: ReaD (200709)";
	skos:exactMatch <http://viaf.org/viaf/sourceID/NDL%7C01102349#skos:Concept>;
	skos:inScheme <http://id.ndl.go.jp/auth#personalNames>.

<http://id.ndl.go.jp/auth/entity/01102349>
	rdf:type <http://xmlns.com/foaf/0.1/Person>;
	foaf:name "石垣隆正";
	rda:dateOfBirth "1955";
	rda:biographicalInformation "物質材料研究機構物質研究所研究員";
	rda:fieldOfActivityOfThePerson "プラズマ科学, セラミック材料".