@prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#>.
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#>.
@prefix owl: <http://www.w3.org/2002/07/owl#>.
@prefix skos: <http://www.w3.org/2004/02/skos/core#>.
@prefix xl: <http://www.w3.org/2008/05/skos-xl#>.
@prefix rdag1: <http://RDVocab.info/ElementsGr1/>.
@prefix rda: <http://RDVocab.info/ElementsGr2/>.
@prefix rdaa: <http://rdaregistry.info/Elements/a/>.
@prefix frbrent: <http://RDVocab.info/uri/schema/FRBRentitiesRDA/>.
@prefix foaf: <http://xmlns.com/foaf/0.1/>.
@prefix ndl: <http://ndl.go.jp/dcndl/terms/>.
@prefix dct: <http://purl.org/dc/terms/>.

<http://id.ndl.go.jp/auth/ndlna/001326242>
	foaf:primaryTopic <http://id.ndl.go.jp/auth/entity/001326242>;
	rdf:type <http://www.w3.org/2004/02/skos/core#Concept>;
	dct:modified "2019-08-07T14:09:45";
	dct:created "2019-08-07";
	xl:prefLabel [xl:literalForm "中川原, 修";ndl:transcription "ナカガワラ, オサム"@ja-Kana,"Nakagawara, Osamu"@ja-Latn];
	rdfs:label "中川原, 修";
	xl:altLabel [xl:literalForm "Nakagawara, Osamu"];
	dct:source "The 15th International Symposium on Sputtering & Plasma Processes, 2019.6","名称は推量";
	skos:exactMatch <http://viaf.org/viaf/sourceID/NDL%7C001326242#skos:Concept>;
	skos:inScheme <http://id.ndl.go.jp/auth#personalNames>.

<http://id.ndl.go.jp/auth/entity/001326242>
	rdf:type <http://xmlns.com/foaf/0.1/Person>;
	foaf:name "中川原修";
	rda:biographicalInformation "村田製作所所属".