@prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#>.
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#>.
@prefix owl: <http://www.w3.org/2002/07/owl#>.
@prefix skos: <http://www.w3.org/2004/02/skos/core#>.
@prefix xl: <http://www.w3.org/2008/05/skos-xl#>.
@prefix rdag1: <http://RDVocab.info/ElementsGr1/>.
@prefix rda: <http://RDVocab.info/ElementsGr2/>.
@prefix rdaa: <http://rdaregistry.info/Elements/a/>.
@prefix frbrent: <http://RDVocab.info/uri/schema/FRBRentitiesRDA/>.
@prefix foaf: <http://xmlns.com/foaf/0.1/>.
@prefix ndl: <http://ndl.go.jp/dcndl/terms/>.
@prefix dct: <http://purl.org/dc/terms/>.

<http://id.ndl.go.jp/auth/ndlna/00440611>
	foaf:primaryTopic <http://id.ndl.go.jp/auth/entity/00440611>;
	rdf:type <http://www.w3.org/2004/02/skos/core#Concept>;
	dct:modified "2024-01-22T09:55:55";
	dct:created "1997-03-31";
	xl:prefLabel [xl:literalForm "Gates, Bruce C"];
	rdfs:label "Gates, Bruce C";
	dct:source "LCCN: n77011181","触媒プロセス化学";
	skos:exactMatch <http://id.loc.gov/authorities/names/n77011181>,<http://viaf.org/viaf/sourceID/NDL%7C00440611#skos:Concept>;
	skos:inScheme <http://id.ndl.go.jp/auth#personalNames>.

<http://id.ndl.go.jp/auth/entity/00440611>
	rdf:type <http://xmlns.com/foaf/0.1/Person>;
	foaf:name "Bruce C Gates".