@prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#>.
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#>.
@prefix owl: <http://www.w3.org/2002/07/owl#>.
@prefix skos: <http://www.w3.org/2004/02/skos/core#>.
@prefix xl: <http://www.w3.org/2008/05/skos-xl#>.
@prefix rdag1: <http://RDVocab.info/ElementsGr1/>.
@prefix rda: <http://RDVocab.info/ElementsGr2/>.
@prefix rdaa: <http://rdaregistry.info/Elements/a/>.
@prefix frbrent: <http://RDVocab.info/uri/schema/FRBRentitiesRDA/>.
@prefix foaf: <http://xmlns.com/foaf/0.1/>.
@prefix ndl: <http://ndl.go.jp/dcndl/terms/>.
@prefix dct: <http://purl.org/dc/terms/>.

<http://id.ndl.go.jp/auth/ndlna/00712564>
	foaf:primaryTopic <http://id.ndl.go.jp/auth/entity/00712564>;
	rdf:type <http://www.w3.org/2004/02/skos/core#Concept>;
	dct:modified "2009-01-20T17:18:33";
	dct:created "1999-02-12";
	xl:prefLabel [xl:literalForm "Semiconductor Equipment and Materials International"];
	rdfs:label "Semiconductor Equipment and Materials International";
	xl:altLabel [xl:literalForm "SEMI";dct:description "略称"];
	dct:source "SEMI technology symposium test session","USMC";
	skos:exactMatch <http://viaf.org/viaf/sourceID/NDL%7C00712564#skos:Concept>;
	skos:inScheme <http://id.ndl.go.jp/auth#corporateNames>;
	ndl:previousName <http://id.ndl.go.jp/auth/ndlna/00536777>.

<http://id.ndl.go.jp/auth/entity/00712564>
	rdf:type <http://xmlns.com/foaf/0.1/Organization>;
	foaf:name "Semiconductor Equipment and Materials International".
<http://id.ndl.go.jp/auth/ndlna/00536777> rdfs:label "Semiconductor Equipment and Materials Institute, Incorporated".