@prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#>.
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#>.
@prefix owl: <http://www.w3.org/2002/07/owl#>.
@prefix skos: <http://www.w3.org/2004/02/skos/core#>.
@prefix xl: <http://www.w3.org/2008/05/skos-xl#>.
@prefix rdag1: <http://RDVocab.info/ElementsGr1/>.
@prefix rda: <http://RDVocab.info/ElementsGr2/>.
@prefix rdaa: <http://rdaregistry.info/Elements/a/>.
@prefix frbrent: <http://RDVocab.info/uri/schema/FRBRentitiesRDA/>.
@prefix foaf: <http://xmlns.com/foaf/0.1/>.
@prefix ndl: <http://ndl.go.jp/dcndl/terms/>.
@prefix dct: <http://purl.org/dc/terms/>.

<http://id.ndl.go.jp/auth/ndlsh/01162212>
	rdf:type <http://www.w3.org/2004/02/skos/core#Concept>;
	dct:modified "2009-06-09T13:00:00";
	dct:created "2009-06-09";
	xl:prefLabel [xl:literalForm "フォトマスク";ndl:transcription "フォトマスク"@ja-Kana,"Fotomasuku"@ja-Latn];
	rdfs:label "フォトマスク";
	dct:source "超LSI、液晶、プリント板を支えるフォトマスク技術のはなし / 田辺功 [ほか]共著","材料名の事典";
	skos:inScheme <http://id.ndl.go.jp/auth#topicalTerms>;
	owl:sameAs <http://id.ndl.go.jp/auth/ndlsh/フォトマスク>;
	skos:relatedMatch <http://id.ndl.go.jp/class/ndlc/ND386>,<http://id.ndl.go.jp/class/ndc9/549.7>;
	skos:related <http://id.ndl.go.jp/auth/ndlsh/00576369>.

<http://id.ndl.go.jp/auth/ndlsh/00576369> rdfs:label "リソグラフィー".