窒化物ワイドギャップ...

窒化物ワイドギャップ半導体の現状と展望 : バルクGaN単結晶成長技術開発の観点から (省エネ創エネを牽引(けんいん)する窒化物ワイドギャップ半導体)

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窒化物ワイドギャップ半導体の現状と展望 : バルクGaN単結晶成長技術開発の観点から(省エネ創エネを牽引(けんいん)する窒化物ワイドギャップ半導体)

Call No. (NDL)
Z15-243
Bibliographic ID of National Diet Library
023822518
Material type
記事
Author
天野 浩
Publisher
東京 : 応用物理学会
Publication date
2012-06
Material Format
Paper
Journal name
応用物理 81(6):2012.6
Publication Page
p.455-463
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Paper Digital

Material Type
記事
Author/Editor
天野 浩
Author Heading
Alternative Title
Progress and prospect of the growth of wide-band-gap group Ⅲ nitrides : Development of the growth method for single-crystal bulk GaN
Periodical title
応用物理
No. or year of volume/issue
81(6):2012.6
Volume
81
Issue
6