Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals
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- Material Type
- 記事
- Author/Editor
- Masashi YamamotoTomohiro TakiTakuto SunadaTomokazu ShikamaShiro NagaokaHironobu UmemotoHideo Horibe
- Author Heading
- Periodical title
- Journal of photopolymer science and technology
- No. or year of volume/issue
- 31(3):2018
- Volume
- 31
- Issue
- 3
- Pages
- 419-424
- Publication date of volume/issue (W3CDTF)
- 2018