Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H₂/O₂ Mixtures Activated on a Tungsten Hot-wire Catalyst
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- Material Type
- 記事
- Author/Editor
- Koki AkitaShota SogoRyusei SogameMasashi YamamotoShiro NagaokaHironobu UmemotoHideo Horibe
- Author Heading
- Periodical title
- Journal of photopolymer science and technology
- No. or year of volume/issue
- 34(5):2021
- Volume
- 34
- Issue
- 5
- Pages
- 499-504
- Publication date of volume/issue (W3CDTF)
- 2021