Volume number111(114) 2011.7.4
Si高指数面酸化過程...

Si高指数面酸化過程のリアルタイム光電子分光による評価 (シリコン材料・デバイス)

Icons representing 記事

Si高指数面酸化過程のリアルタイム光電子分光による評価

(シリコン材料・デバイス)

Call No. (NDL)
Z16-940
Bibliographic ID of National Diet Library
11200033
Material type
記事
Author
大野 真也ほか
Publisher
東京 : 電子情報通信学会
Publication date
2011-07-04
Material Format
Paper
Journal name
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 111(114) 2011.7.4
Publication Page
p.23~27
View All

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

  • CiNii Research

    Search Service
    You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper

Material Type
記事
Author/Editor
大野 真也
井上 慧
森本 真弘 他
Alternative Title
Characterization of initial oxidation process on high-index silicon surfaces by real-time photoemission spectroscopy
Periodical title
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue
111(114) 2011.7.4
Volume
111
Issue
114