溶液気化CVD法によ...

溶液気化CVD法によるDRAM用高誘電率キャパシタ膜形成技術の開発

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溶液気化CVD法によるDRAM用高誘電率キャパシタ膜形成技術の開発

Call No. (NDL)
Z17-313
Bibliographic ID of National Diet Library
4512251
Material type
記事
Author
松野 繁ほか
Publisher
仙台 : 日本金属学会 ; 1994-
Publication date
1998-06
Material Format
Paper
Journal name
まてりあ = Materia Japan 37(6) 1998.06
Publication Page
p.528~530
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Paper

Material Type
記事
Author/Editor
松野 繁
内川 英興
渡井 久男 他
Periodical title
まてりあ = Materia Japan
No. or year of volume/issue
37(6) 1998.06
Volume
37
Issue
6
Pages
528~530
Publication date of volume/issue (W3CDTF)
1998-06