Control of Orientation for Polycrystalline Silicon Thin Films Fabricated from Fluorinated Source Gas by Microwave Plasma Enhanced Chemical Vapor Deposition
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- Material Type
- 記事
- Author/Editor
- Kouichi NakahataAtsushi MiidaToshio Kamiya 他
- Author Heading
- Periodical title
- Japanese journal of applied physics. Pt. 2, Letters
- No. or year of volume/issue
- 37(9A/B) 1998.09
- Volume
- 37
- Issue
- 9A/B
- Pages
- L1026～1029
- Publication date of volume/issue (W3CDTF)
- 1998-09