半経験的分子軌道法に...

半経験的分子軌道法によるSi2Cl-H2系CVD反応の素過程の予測

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半経験的分子軌道法によるSi2Cl-H2系CVD反応の素過程の予測

Call No. (NDL)
Z17-314
Bibliographic ID of National Diet Library
4692042
Material type
記事
Author
斎藤 永宏ほか
Publisher
仙台 : 日本金属学会 ; 1937-
Publication date
1999-03
Material Format
Paper
Journal name
日本金属学会誌 = The journal of the Japan Institute of Metals and Materials 63(3) 1999.03
Publication Page
p.319~325
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Paper

Material Type
記事
Author/Editor
斎藤 永宏
不破 章雄
Periodical title
日本金属学会誌 = The journal of the Japan Institute of Metals and Materials
No. or year of volume/issue
63(3) 1999.03
Volume
63
Issue
3
Pages
319~325
Publication date of volume/issue (W3CDTF)
1999-03