Electron Cyclotron Resonance-Reactive Ion Beam Etching of InP by Cyclic Injection of CH4/H2/Ar and O2
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- Material Type
- 記事
- Author/Editor
- Tatsuya SuzukiNobuo HanejiKunio Tada 他
- Author Heading
- Periodical title
- Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
- No. or year of volume/issue
- 41(1) (通号 550) 2002.1
- Volume
- 41
- Issue
- 1
- Sequential issue number
- 550
- Pages
- 15～19