Fluoride Resonant Tunneling Diodes Co-integrated with Si-MOSFETs (Special Issue Solid State Devices & Materials)

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Fluoride Resonant Tunneling Diodes Co-integrated with Si-MOSFETs(Special Issue Solid State Devices & Materials)

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
6157011
Material type
記事
Author
Toshiaki Terayamaほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
2002-04
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 41(4B) (通号 556) (Special Issue) 2002.4
Publication Page
p.2598~2601
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Detailed bibliographic record

Summary, etc.:

Resonant tunneling diodes (RTDs) composed of heteroepitaxial CaF<FONT SIZE="-1"><SUB>2</SUB></FONT>/CdF<FONT SIZE="-1"><SUB>2</SUB></FONT>/CaF<FONT SI...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Toshiaki Terayama
Hiroshi Sekine
Kazuo Tsutsui
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
41(4B) (通号 556) (Special Issue) 2002.4
Volume
41
Issue
4B
Sequential issue number
556