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雑誌プラズマ・核融合学会誌
Volume number79(1)-79(6) 20030100-20030600
ArticleEUVリソグラフィ光...

EUVリソグラフィ光源としてのプラズマ--その理論的な考察について (小特集 リソグラフィ用EUV(極端紫外)光源研究の現状と将来展望)

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EUVリソグラフィ光源としてのプラズマ--その理論的な考察について(小特集 リソグラフィ用EUV(極端紫外)光源研究の現状と将来展望)

Call No. (NDL)
Z15-8
Bibliographic ID of National Diet Library
6519588
Material type
記事
Author
米田 仁紀
Publisher
名古屋 : プラズマ・核融合学会編集委員会
Publication date
2003-03
Material Format
Digital
Journal name
プラズマ・核融合学会誌 = Journal of plasma and fusion research / プラズマ・核融合学会編集委員会 編 79(3) 2003.3
Publication Page
p.226～233
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Detailed bibliographic record

Summary, etc.：

An extreme ultraviolet (EUV) radiation source is a critical factor for the success of EUV lithography. Although there are many methods and operating p...

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Digital

Material Type
記事
Title
EUVリソグラフィ光源としてのプラズマ--その理論的な考察について
Author/Editor
米田 仁紀
Series Title
小特集 リソグラフィ用EUV(極端紫外)光源研究の現状と将来展望
Author Heading
米田 仁紀
Periodical title
プラズマ・核融合学会誌 = Journal of plasma and fusion research / プラズマ・核融合学会編集委員会 編
No. or year of volume/issue
79(3) 2003.3
Volume
79
Issue
3
Pages
226～233