Energy Band Profile of Hafnium Silicates Estimated by X-Ray Photoelectron Spectroscopy

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Energy Band Profile of Hafnium Silicates Estimated by X-Ray Photoelectron Spectroscopy

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
7194365
Material type
記事
Author
Toshihide Itoほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
2004-12
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 43(12) (通号 605) 2004.12
Publication Page
p.8199~8202
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Detailed bibliographic record

Summary, etc.:

Amorphous hafnium silicate films with several composition ratios were deposited on Si substrates by plasma-enhanced chemical vapor deposition, and the...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Toshihide Ito
Hiromitsu Kato
Tomohiro Nango 他
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
43(12) (通号 605) 2004.12
Volume
43
Issue
12
Sequential issue number
605
Pages
8199~8202