Optical Emission Spectrometry of Plasma in Low-Damage Sub-100nm Tungsten Gate Reactive Ion Etching Process for Compound Semiconductor Transistors (Special Issue: Plasma Processing)
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- Material Type
- 記事
- Author/Editor
- Xu LiHaiping ZhouChris D. W. Wilkinson 他
- Series Title
- Author Heading
- Periodical title
- Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
- No. or year of volume/issue
- 45(10B) (通号 642) (Special Issue) 2006.10
- Volume
- 45
- Issue
- 10B
- Sequential issue number
- 642