スパッタリング法によるLiMn2O4薄膜の生成 (シリコン材料・デバイス)

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スパッタリング法によるLiMn2O4薄膜の生成

(シリコン材料・デバイス)

Call No. (NDL)
Z16-940
Bibliographic ID of National Diet Library
8763265
Material type
記事
Author
以西 雅章ほか
Publisher
東京 : 電子情報通信学会
Publication date
2007-05
Material Format
Paper
Journal name
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 107(56) 2007.5.24・25
Publication Page
p.93~96
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Paper

Material Type
記事
Author/Editor
以西 雅章
中村 功一
長南 祐史 他
Alternative Title
Preparation of LiMn2O4 films by sputtering method
Periodical title
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue
107(56) 2007.5.24・25
Volume
107
Issue
56