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Effects of hydrogen dilution ratio on properties of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high-frequency plasma-enhanced chemical vapor deposition

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Effects of hydrogen dilution ratio on properties of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high-frequency plasma-enhanced chemical vapor deposition

Call No. (NDL)
Z54-J337
Bibliographic ID of National Diet Library
8835656
Material type
記事
Author
Shinsuke Miyajimaほか
Publisher
Tokyo : Japan Society of Applied Physics
Publication date
2007-07
Material Format
Paper
Journal name
Japanese journal of applied physics. Part 2, Letters & express letters 46(25-28) (通号 455) 2007.7
Publication Page
p.L693~695
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Paper

Material Type
記事
Author/Editor
Shinsuke Miyajima
Makoto Sawamura
Akira Yamada 他
Periodical title
Japanese journal of applied physics. Part 2, Letters & express letters
No. or year of volume/issue
46(25-28) (通号 455) 2007.7
Volume
46
Issue
25-28
Sequential issue number
455
Pages
L693~695