高周波電力を重畳した直流反応性スパッタ法によるTaAl-N薄膜の作製 (第48回真空に関する連合講演会プロシーディングス--2007年11月14日～16日,東京)
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- Material Type
- 記事
- Author/Editor
- 岡野 夕紀子田尻 修一青園 隆司 他
- Series Title
- Alternative Title
- TaAl-N thin film prepared by radio frequency and direct current reactive sputtering
- Periodical title
- Journal of the Vacuum Society of Japan = 真空
- No. or year of volume/issue
- 51(3) 2008.3
- Volume
- 51
- Issue
- 3