誘導結合プラズマ支援型多重磁極マグネトロンスパッタ法により作製したCu薄膜に及ぼす陽極電圧と基板バイアス電圧の効果
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- Material Type
- 記事
- Author/Editor
- 村岡 裕紀烏帽子 良黒川 重雄 他
- Alternative Title
- Effect of substrate DC bias voltage and anode voltage on the properties of Cu films using magnetron sputtering with multipolar magnetic plasma confinement assisted by inductively coupled plasma
- Periodical title
- Journal of the Vacuum Society of Japan = 真空
- No. or year of volume/issue
- 51(6) 2008.6
- Volume
- 51
- Issue
- 6
- Pages
- 408～411