Boron-doped microcrystalline silicon oxide film for use as back surface field in cast polycrystalline silicon solar cells
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- Material Type
- 記事
- Author/Editor
- Amornrat LimmaneeTsutomu SugiuraHiroshi Yamamoto 他
- Author Heading
- Periodical title
- Japanese journal of applied physics : JJAP
- No. or year of volume/issue
- 47(12) 2008.12
- Volume
- 47
- Issue
- 12
- Pages
- 8796～8798
- Publication date of volume/issue (W3CDTF)
- 2008-12